The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Jan. 22, 1999
Applicant:
Inventors:
Hiroshi Muramatsu, Chiba, JP;
Nobuhiro Shimizu, Chiba, JP;
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; G01B 5/28 ;
U.S. Cl.
CPC ...
B44C 1/22 ; G01B 5/28 ;
Abstract
A method of fabricating a probe comprises disposing a resist film over a base plate. A mask pattern comprised of a cantilever mask pattern and a probe mask pattern is disposed over the base plate for forming a cantilever portion and a probe portion, respectively, of a probe so that the probe mask pattern subtends an angle relative to the base plate that is no greater than an angle made by at least two crystal planes of a tip of the probe portion to the base plate. The mask pattern is then exposed, and an etching operation is conducted using the exposed mask pattern to form the probe having the cantilever portion and the probe portion.