The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Dec. 20, 1999
Applicant:
Inventors:
Kun Pi Cheng, Hsin-Chu, TW;
I-Chung Chang, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/126 ;
U.S. Cl.
CPC ...
G01B 1/126 ;
Abstract
A method of overlaying two images and from this overlay observe and measure the accuracy of the alignment of the wafer. Wafer misalignment can be readily corrected based on the results of these observations. Alignment marks are provided on the surface of the wafer that is being validated for accuracy of alignment. The position of this mark relative to a pattern provided on the surface of a control wafer is measured and forms an indication of the alignment of the wafer.