The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Oct. 27, 1998
Yohichi Okumura, Tokyo, JP;
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
To offer a technique that can form electrodes in a composite device without using a lift-off method. In the manufacture of a composite device in which a wafer that has a sacrificial layer is used, a mask film that has been patterned is formed; patterning is given to a structural layer , the sacrificial layer is etched from the area that is exposed, a movable part is formed in an area where said sacrificial layer is removed, and a fixed part is formed in an area where the sacrificial layer remains; also, a thin metallic film is formed and patterning is given before forming the mask film , with electrodes for an external electrical connection being formed. A protective film thin titanium tungsten film is formed on the surface of said thin metallic film , with the thin metallic film being protected during etching of the sacrificial layer . It can be done without using a lift-off method, and the thin film wiring and the electrodes can also be formed from the same thin metallic film
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile