The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Mar. 06, 2000
William J. Dauksher, Mesa, AZ (US);
Pawitter S. Mangat, Gilbert, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method for fabricating a patterning mask is disclosed in which a membrane layer is deposited on a first surface of a substrate. Patterned and unpatterned portions of the substrate are then defined on a second surface of the substrate. A majority of the thickness of substrate in the unpatterned portions is then dry etched to partially define a strut having sidewalls that are substantially perpendicular to the first surface. Wet etching is then performed to etch through the remaining thickness of the substrate to expose the bottom surface of the membrane layer and completely define the strut. Scattering elements may then be formed over the membrane layer. In one embodiment, the substrate is silicon and has a ( ) orientation and an edge of the silicon struts is aligned to a { } plane. In another embodiment, an edge of the silicon struts is aligned to a { } plane.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile