The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Nov. 17, 1999
Applicant:
Inventor:
Andrew Duncan McQuarrie, San Jose, CA (US);
Assignee:
Surface Technology Systems plc, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; B44C 1/22 ;
U.S. Cl.
CPC ...
H01L 2/100 ; B44C 1/22 ;
Abstract
In the manufacture of a micromechanical device, a substrate, having a mask thereon, is etched using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate. A layer of protecting substance is deposited on the exposed surfaces of the substrate and mask, and the protecting substance is then selectively removed from the base. The base is then etched using the fluorine-containing etchant.