The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2002

Filed:

Jun. 09, 1999
Applicant:
Inventor:

Kuo-Tung Sung, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ; H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/1336 ; H01L 2/176 ;
Abstract

A method for improving an edge recess of a shallow trench isolation (STI). A SiO layer with gap-filling ability is formed to fill the edge recess at the top corner of the STI. A part of the SiO layer on the substrate is then removed, leaving a part of the SiO layer to fill the edge recess and to cover a sidewall of the substrate at the edge.


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