The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2002
Filed:
Apr. 14, 2000
Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device
Toshifumi Suganaga, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A reticle for use in exposing a semiconductor capable of increasing the contrast of a resist pattern to be formed on a wafer through exposure without involvement of a change in the geometry of a diaphragm plate even when a circuit pattern formed on a reticle becomes more minute; a method of producing the reticle; and a semiconductor device. The irregularities are formed in the glass surface of the halftone reticle , thus enabling uniform diffusion of the illumination light over the glass surface . Consequently, the oblique incident light effective for improving the contrast of an image to be formed on the wafer can be readily and inexpensively increased without involvement of complicated processes. Even when the hole pattern becomes minute, the contrast of a resist pattern to be radiated on the wafer can be improved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile