The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2002

Filed:

Feb. 22, 2000
Applicant:
Inventors:

Semyon Sherstinsky, San Francisco, CA (US);

Alison Gilliam, Fremont, CA (US);

Paul Smith, San Jose, CA (US);

Leonel A. Zuniga, San Jose, CA (US);

Ted Yoshidome, Oakland, CA (US);

Nitin Khurana, Milpitas, CA (US);

Rod Mosely, Pleasanton, CA (US);

Umesh Madhav Kelkar, Sunnyvale, CA (US);

Joseph Yudovsky, Campbell, CA (US);

Alan Popiolkowski, Los Banos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; C23C 1/400 ;
U.S. Cl.
CPC ...
C23C 1/600 ; C23C 1/400 ;
Abstract

A gas delivery apparatus and method for directing a flow of gas to the edge of a substrate at an angle to the radial direction of the substrate is provided. The apparatus directs the gas from a gas opening, over a plurality of grooves that are angled relative to a radial line originating at a center of the gas delivery apparatus. Subsequently, the gas is flowed over a portion of the substrate to prevent reactive gases from depositing on selective portions of the substrate.


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