The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2002
Filed:
Dec. 04, 2000
Applicant:
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo-To, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
Abstract
In the plasma processor, the microwaves generated from a microwave generator ( ) are led to a plane antenna ( ), which in turn introduces exponentially attenuating microwaves into a container ( ) that processes an object (W) in plasma. Microwave absorption device ( ) provided in the circumference of the plane antenna ( ) absorbs microwaves propagating from the center of the plane antenna ( ) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna ( ) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.