The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2002
Filed:
Mar. 07, 2000
Applicant:
Inventor:
Hiroshi Yoshida, Kawanishi, JP;
Assignee:
Japan Science and Technology Corporation, Kawaguchi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C30B 2/904 ;
U.S. Cl.
CPC ...
C30B 2/904 ;
Abstract
In synthesizing a diamond by a vapor-phase growth method, a sputtering method, or a high-pressure and high-temperature synthesis method, N, P or As as an n-type dopant, and H as a p-type dopant are simultaneously doped in a crystal to form a donor-acceptor pair in the crystal, to thereby synthesize a transparent n-type diamond having low resistance.
Yoshida, Hiroshi. (2002). Method for synthesizing n-type diamond having low resistance (U.S. Patent No. 6340393). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6340393
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile