The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2002
Filed:
Mar. 22, 2000
Yukito Nakagawa, Tokyo, JP;
Ken'ichi Takagi, Fukuoka-ken, JP;
Anelva Corporation, Fuchu, JP;
Abstract
A vacuum chamber includes a lower chamber , a power lead-in section and an upper chamber , these being in communication with one another. A discharge chamber is constituted by the power lead-in section and the upper chamber . The lower chamber is made of metal. The power lead-in section is one which has a ring shape, and in which a ring-shaped antenna is embedded in a dielectric element . The inner and outer periphery and the bottom surface of the dielectric element are covered by an electrically conductive cover . The height position of the top surface of a substrate holder (the surface thereof which carries a substrate ) is a high position which is higher than the height of the uppermost portion of the power lead-in section . In the interior of the discharge chamber discharge is produced and a plasma is generated by high-frequency power supplied from the power lead-in section . The substrate is processed by this plasma.