The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Oct. 05, 2000
Keiichi Matsushima, Nirasaki, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
A processing system comprises a plurality of processing vessels ( A to D) provided with openings in which a wafer (W) is subjected to predetermined processes, and a common transfer vessel ( ) connected to the openings of the processing vessels. A transfer mechanism ( ) capable of turning, bending and stretching is installed in the common transfer vessel to transfer the wafer (W) between the common transfer vessel ( ) and the processing vessels ( A to D). Stand-by spaces ( A to D), where the wafer (W) is held temporarily, are determined so as to correspond to the openings of the processing vessels ( A to D), respectively. Position sensors ( - to - ) are assigned in pairs to the stand-by spaces to measure the position of the perimeter of the wafer. The position sensors are arranged so that each stand-by space ( A to D) shares one of the pair of position sensors with the adjacent stand-by space for common use. A control means determines an offset of the object held by the transfer mechanism on the basis of the position of the perimeter of the object detected by the position sensors and controls the operation of the transfer mechanism so as to correct the offset of the object.