The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2002
Filed:
Jun. 28, 2000
Wen-Ben Chou, Palo Alto, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Ching-Hwa Chen, Milpitas, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method of cleanly etching an organic polymer layer disposed over a substrate is disclosed. The invention is particularly useful in damascene processing where openings are etched in the organic polymer layer to form interconnects. The method includes lowering the temperature of the substrate. The method also includes flowing H O vapor over the organic polymer layer and condensing (or freezing) the H O vapor on the organic polymer layer. The method additionally includes etching through the organic polymer layer and the condensed H O vapor to form an opening having a side wall. The condensed (or frozen) H O vapor is arranged to form a passivating film (of ice) along the side wall of the opening to protect the side wall from etching.