The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2002

Filed:

Feb. 22, 2000
Applicant:
Inventor:

Gerald Motulla, Berlin, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 2/700 ; B05D 5/12 ;
U.S. Cl.
CPC ...
G01R 2/700 ; B05D 5/12 ;
Abstract

A method and device are provided for determining a parameter for the reproducible production of raised contact metallizations ( ) on terminal areas of a substrate. Metallization material is deposited in a metallization bath. A test substrate is employed having at least two terminal areas adjacent at a defined spacing. The substrate is introduced into the metallization bath ( ) and the parameter is determined from the variation in an electrical quantity as a consequence of an electrical contact resulting to from the deposition of the metallization material for building up the contact metallizations ( ) on the adjacent terminal areas.


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