The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2001

Filed:

Aug. 04, 2000
Applicant:
Inventors:

Amnon Manassen, Haifa, IL;

Giora Yahav, Haifa, IL;

Gavriel J. Iddan, Haifa, IL;

Assignee:

3DV Systems Ltd., Yokneam, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/03 ; H01L 2/906 ;
U.S. Cl.
CPC ...
G02F 1/03 ; H01L 2/906 ;
Abstract

An optical image shutter is provided having a multiplicity of thin layers of alternating narrow and wide gap semiconductor material stacked to form an MQW structure and electrodes located on at least two semiconductor surfaces of the image shutter, wherein the electrodes are configured so that a voltage difference applied between them produces an electric field that is temporally and spatially substantially uniform in the volume of the MQW structure and wherein the aperture of the image shutter is greater than 4 square mm.


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