The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Aug. 04, 2000
Bruce J. Dover, Lockport, NY (US);
Carl Vander Weide, Lockport, NY (US);
Edward V. McCormick, Churchville, NY (US);
Harper International Corp., Lancaster, NY (US);
Abstract
A purge chamber for providing a controlled atmosphere for the treatment of materials comprises a housing within which materials to be treated may be passed through and subjected to a cross-flow of purging gas entering and exiting through a multiplicity of inlets and outlets positioned along the length of the housing. Exiting gas may be recycled and re-entered in combination with fresh gas. In practice, materials to be treated may be conveyed through the chamber while the atmosphere surrounding the materials is continuously exchanged. Flapper doors, spanning the width of the chamber, are positioned along the path of travel of the materials being treated to direct the cross-flow of purging gas and prevent the entry of unwanted gases.