The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Apr. 26, 2001
Katsumi Ishii, Fujino-machi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A processing method for processing a substrate has a vertical thermal processing furnace,having a bottom and an opening,provided at the bottom. A boat,holding substrates W in vertical multistairs can be placed on a first lid,and the first lid,can open and close the opening,of the vertical thermal processing furnace,with the boat,placed thereon. The processing unit also has a boat-placing portion,on which the boat,and another boat,can be placed and a boat conveying mechanism,for conveying the two boats,alternatively between the boat-placing portion,and the first lid,A second lid,hermetically closes the opening,of the vertical thermal processing furnace,when the first lid,opens the opening,but no boat,passes through the opening,The processing unit can effectively reduce the undesirable influence from the opening,when the first lid,is taken off from the opening,and the boat,is conveyed out, and can also reduce the wasted energy by preventing the fall of the temperature in the interior of the thermal processing furnace