The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Mar. 17, 1999
Applicant:
Inventor:
Shinji Wakui, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; G03B 2/762 ;
U.S. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; G03B 2/762 ;
Abstract
An exposure apparatus for exposing and transferring a reticle pattern to a photosensitive substrate includes a table for holding the reticle or photosensitive substrate, and a parallel link mechanism for positioning the table. An apparatus for positioning first and second objects relative to each other includes a first parallel link mechanism for holding and moving the first object, and a second parallel link mechanism for holding and moving the second object. The first and second parallel link mechanisms are supported by a common base plate. The base plate supports a third object. The first and second objects are positioned with respect to the third object.