The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Nov. 02, 1999
Applicant:
Inventors:
Zyi Gerald Loewy, Fair Lawn, NJ (US);
William Chiang, Monmouth Junction, NJ (US);
Hoi Cheong Sun, Dayton, NJ (US);
Bryan Lloyd Bentz, Princeton, NJ (US);
Assignee:
Sarnoff Corporation, Princeton, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12Q 1/68 ; B05D 1/04 ; B05D 1/12 ; H05C 1/00 ;
U.S. Cl.
CPC ...
C12Q 1/68 ; B05D 1/04 ; B05D 1/12 ; H05C 1/00 ;
Abstract
Provided is a method of fabricating a substrate having on a surface thereof two or more spatially-resolved regions, each with a defined amount or concentration of one of one or more chemical components, the method comprising: associating a chemical component with particles of 1 &mgr;m to 500 &mgr;m diameter; electrostatically depositing the particles on the appropriate regions; and if a said spatially-resolved region is to receive a second chemical component, repeating steps (a) and (b) for that chemical component and the appropriate regions.