The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Aug. 23, 2000
Roy D. McGregor, El Camino Village, CA (US);
Michael B. Petach, Redondo Beach, CA (US);
Rocco A. Orsini, Long Beach, CA (US);
TRW Inc., Redondo Beach, CA (US);
Abstract
A laser-plasma EUV radiation source (,) that generates larger liquid droplets (,) for the plasma target material. The EUV source (,) forces a liquid (,), preferably Xenon, through a nozzle (,), instead of forcing a gas through the nozzle. The geometry of the nozzle (,) and the pressure of the liquid (,) through the nozzle (,) atomizes the liquid (,) to form a dense spray (,) of droplets (,). Because the droplets (,) are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser (,) is used to convert gaseous Xenon (,) to the liquid (,) prior to being forced through the nozzle (,).