The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Mar. 12, 1999
Applicant:
Inventors:
Patrick Foster, Providence, RI (US);
Sydney George Slater, Cumberland, RI (US);
Thomas Steinhäusler, Riverside, RI (US);
Andrew J. Blakeney, Seekonk, MA (US);
John Joseph Biafore, Providence, RI (US);
Assignee:
Arch Specialty Chemicals, Inc., Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
C08L 2/902 ; C08L 2/908 ;
U.S. Cl.
CPC ...
C08L 2/902 ; C08L 2/908 ;
Abstract
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.