The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Aug. 10, 1998
Applicant:
Inventors:
Toshiharu Furukawa, Essex Junction, VT (US);
Mark C. Hakey, Milton, VT (US);
Steven J. Holmes, Milton, VT (US);
David V. Horak, Essex Junction, VT (US);
William H. Ma, Fishkill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H01L 2/1336 ; H01L 2/126 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H01L 2/1336 ; H01L 2/126 ;
Abstract
A method of forming oxide and gate oxide areas of differing thicknesses. The processes disclosed include using an electromagnetic wave light at differing exposure durations and/or different energy levels to create oxide of differing thicknesses on a layer. The electromagnetic wave is preferably a laser.