The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Aug. 23, 1999
Applicant:
Inventors:
Nicole Rutherford, Saratoga, CA (US);
James S. Drage, Fremont, CA (US);
Ron Katsanes, Newark, CA (US);
Hui-Jung Wu, Fremont, CA (US);
Teresa Ramos, Albuquerque, NM (US);
Assignee:
AlliedSignal Inc., Morristown, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 1/730 ;
U.S. Cl.
CPC ...
C03C 1/730 ;
Abstract
A surface-coated nanoporous silica dielectric film that is prepared by a process comprising the steps of forming a nanoporous silica dielectric coating on a substrate, and coating the formed nanoporous silica dielectric film with a coating composition comprising a polymer precursor, under conditions effective to form a strength-enhancing and/or hydrophobicity enhancing layer on the treated nanoporous silica dielectric film.