The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2001

Filed:

Jan. 18, 2000
Applicant:
Inventors:

Kazumi Haga, Tokyo, JP;

Motoshi Sakai, Tokyo, JP;

Yoshihiro Ishiguro, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

A method enables measurement of the configuration of a pattern with irregularity in a wide surface region with a high accuracy and in a single operation. The surface inspecting method includes irradiating a measurement objective region with an illuminating light in an oblique direction thereto; forming an image of reflected light from the measurement objective region, the formed image of reflected light having points with luminance corresponding to the incident angle of the illuminating light at respective points on the measurement objective region picking up the formed image to collect luminance data of respective points in the measurement objective region; analyzing spatial frequencies of the luminance data with respect to positions in a desired direction to make a plurality of spatial frequency data; and extracting a desired frequency component from the plurality of spatial frequency data.


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