The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Oct. 06, 2000
Applicant:
Inventors:
Werner Blersch, Bussmannshausen, DE;
Heinrich Walk, Allmendingen, DE;
Assignee:
Steag RTP Systems GmbH, , DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F27B 5/14 ;
U.S. Cl.
CPC ...
F27B 5/14 ;
Abstract
An apparatus for the thermal treatment of substrates is provided. The apparatus includes a reaction chamber, at least one elongated heat source, and at least one reflection wall that is disposed adjacent to the heat source and serves to reflect at least a portion of the radiation given off thereby. The reflection wall has at least one rib, and the heat source is disposed at an oblique angle to the longitudinal direction of the rib.