The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

Apr. 10, 2000
Applicant:
Inventors:

John Maltabes, Dresden, DE;

Alain Charles, Dresden, DE;

Karl Mautz, Dresden, DE;

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 4/108 ;
U.S. Cl.
CPC ...
H01L 4/108 ;
Abstract

A lithography chuck (,) holds a flat object (,), such as a semiconductor wafer (,) at the backside (,). The chuck has, supported on a base plate (,), a plurality of pins (,-n) to receive partial forces (F,) from the backside (,) and a plurality of piezoelectric elements (,-n) attached to the pins to sense the partial forces (F,) applied from the object (,) to the pins (,-n). The piezoelectric elements (,-n) apply partial displacements (B,) of the pins (,-n) to act on selected areas of the object (,) and thereby compensate for irregularities in the backside contour.


Find Patent Forward Citations

Maltabes, John. (2001). Lithography chuck having piezoelectric elements, and method (U.S. Patent No. 6313567). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6313567

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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