The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Mar. 12, 1999
Tadamoto Tamai, Fujisawa, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An ion implantation apparatus has a vacuum chamber, a beam exposure region defined in an end of the vacuum chamber, and a pair of substrate holding robots disposed one on each side of the beam exposure region, each for holding a semiconductor wafer to allow the semiconductor wafer to be exposed to a beam in the beam exposure region. A pair of load-lock chambers is disposed in an opposite end of the vacuum chamber in confrontation with the substrate holding robots, respectively. A pair of feed robots is disposed between the load-lock chambers and the substrate holding robots, respectively. The vacuum chamber houses a relay table disposed between the feed robots, for relaying a semiconductor wafer.