The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2001
Filed:
Apr. 22, 1999
Kozaburo Hayashi, Tochigi, JP;
Hiraku Kominami, Tochigi, JP;
Mieko Tanaka, Tochigi, JP;
Misao Konishi, Tochigi, JP;
Sony Chemicals Corporation, Tokyo, JP;
Abstract
The present invention aims to provide a resin suitable for use as a protective layer or adhesive layer formed on the surface of a metal film. A liquid oligomer having a high specific gravity of 1.10 or more is contained in a photocurable resin involved in photopolymerization of a resin composition. Upon application on a metal film,and photopolymerization, bulky substituents owned by the high-specific gravity liquid oligomer prevent penetration of moisture to provide a protective film,with low water permeability. Said high-specific gravity liquid oligomer should desirably be contained in the photocurable resin within the range from 35% by weight to 78% by weight both inclusive.