The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Nov. 22, 1999
Applicant:
Inventors:
Erich Merz, Essingen, DE;
Jochen Becker, Oberkochen, DE;
Assignee:
Carl-Zeiss-Stiftung, Heidenheim, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 7/02 ;
U.S. Cl.
CPC ...
G02B 7/02 ;
Abstract
An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element,, in particular a lens or a mirror, which is arranged in a mount,or an inner ring,, and actuators,and,. A plurality of actuators,and,act on the deformable inner ring,via a radial force-displacement transmission,in order to generate tensile and/or compressive forces.
Merz, Erich. (2001). Optical system, in particular projection-illumination unit used in microlithography (U.S. Patent No. 6307688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6307688
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile