The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
May. 27, 1998
Applicant:
Inventor:
William H. Mullee, Portland, OR (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 ;
U.S. Cl.
CPC ...
G03F 7/42 ;
Abstract
A commercially available solvent, such as a stripping chemical and/or an organic solvent, is supported by supercritical CO,to remove a resist, its residue, and/or an organic contaminant off the surface of a semiconductor wafer. Supercritical CO,has a high solvency which increases with pressure. The supercritical CO,permits a tremendous reduction in reaction time and amount of chemical utilized for the resist removal process. In a preferred embodiment, the wafer is exposed to the CO,and chemical mixture in a process chamber heated to a temperature of 20 to 80° C. at a pressure of 1050 to 6000 psig for a period of 10 seconds to 15 minutes.