The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Jun. 07, 2000
Hideo Tamura, Nara, JP;
Yasushi Fujioka, Kyoto, JP;
Masahiro Kanai, Kyoto, JP;
Akira Sakai, Kyoto, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The sputtering method of the present invention comprises the steps of forming a plurality of tunnel-like magnetic fluxes on a target, forming an electric field between the target and a belt-like substrate, and conveying the belt-like substrate while reciprocating the plurality of tunnel-like magnetic fluxes at least in the direction of conveying the belt-like substrate, wherein the speed v of conveying the substrate, the distance L in the direction of conveying the belt-like substrate between two adjacent points where the magnetic field of the plurality of tunnel-like magnetic fluxes and the electric field cross each other at a right angle, and the period T of the reciprocating motion of the plurality of tunnel-like magnetic fluxes are controlled so as to L/v=(n+½)T wherein n is z−{fraction (1/16)}<n<z+{fraction (1/16)} and z is an integer equal to or greater than 0. The present method can solve the problem of the prior art that when a sputtering apparatus is applied to a roll-to-roll system magnetron sputtering apparatus, any part of a belt-like substrate is subjected to sputtering for a different sputtering time, thereby deteriorating the distribution of film thickness in the direction of conveying the belt-like substrate.