The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2001
Filed:
May. 13, 1999
Ryoji Hagiwara, Chiba, JP;
Seiko Instruments Inc., , JP;
Abstract
An optical observing apparatus has a sample stage for moving a sample to a desired location to be operated upon at a target position by a charged particle beam apparatus so that the target position can be visually observed, an optical observation system for magnifying the sample for visual observation of the target position, a marking system for moving the sample based on the visual observation and marking the sample at one or more locations from which the target position can be determined without the need for further visual observation so that the target position may be located by the charged particle beam apparatus even when the target position can not be visually observed by use of the charged particle beam apparatus, and a control system for storing the target position and the location of the one or more markings together with an optical observation image and corresponding stage coordinate. In a preferred embodiment, the marking system is a laser marking system for producing a plurality of laser beams on the same optical axis, each having a different wavelength, so that an appropriate laser beam may be selected based upon the nature of the sample. The sample has an underlying structure covered by a layer of transparent material, so that the underlying structure can be visually observed by means of the optical observation system but cannot be observed by use of the charged particle beam apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile