The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2001

Filed:

Jul. 20, 2000
Applicant:
Inventor:

Bing-Chang Wu, Hsin-Chu Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract

A semiconductor wafer has a dielectric layer. A bottom plate recess is first formed in the dielectric layer, and a metal bottom plate is formed in the bottom plate recess. An insulation layer is formed on the metal bottom plate, and a via hole is formed in the insulation layer. A first metal layer is then formed on the insulation layer that fills the via hole so as to form a via plug. Finally, a metal upper plate is formed on the insulation layer, and a metal wire is formed on top of the via plug.


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