The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Jan. 30, 1997
Applicant:
Inventors:
Roland Rupp, Lauf, DE;
Johannes Voelkl, Erlangen, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A process gas stream (,) is generated, from which SiC is deposited on a substrate (,) by means of CVD. Furthermore, a second gas stream (,) of an inert gas is generated, which substantially surrounds the process gas stream (,) in its direction of flow. This results in a higher yield of the process gases.
Rupp, Roland. (2001). Method and apparatus for the production of sic by means of cvd with improved gas utilization (U.S. Patent No. 6299683). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6299683
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile