The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
Mar. 12, 1999
Applicant:
Inventor:
Toshifumi Suganaga, Tokyo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract
Disclosed herein is how to obtain the magnitude of focus deviation and the direction of the deviation directly from a focus measuring mark. The magnitude of focus deviation is measured from the length of the focus measuring mark (,) in the elongate direction. The length of a tapered part (,) of the focus measuring mark (,) in which the resist gradually becomes thinner is measured from the secondary electron signal waveform of a scanning electron microscope. The direction of the focus deviation is obtained from the measured length of the tapered part (,).