The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
May. 19, 1998
Adam A. Brailove, Gloucester, MA (US);
Matthew Charles Gwinn, Salem, MA (US);
Eaton Corporation, Beverly, MA (US);
Abstract
An ion source (,) includes a plasma confinement chamber and a plasma electrode (,) forming a generally planar wall section of the plasma confinement chamber. The plasma electrode (,) has at least one opening (,) for allowing an ion beam (,) to exit the confinement chamber and has a set of magnets (,) that generate a magnetic field extending across the openings (,) in the plasma electrode (,). The openings (,) in the plasma electrode (,) can be fashioned as elongated slots or circular openings aligned along the axis. The ion source (,) can further include a power supply (,) for negatively biasing the plasma electrode relative to the plasma confinement chamber and an insulator (,) for electrically insulating the plasma electrode (,). Cooling tubes can also be provided to transfer heat away from the magnets in the plasma electrode (,).