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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6294099 B1

PDFFull Text
Date of Patent:
Sep. 25, 2001

Filed:

Nov. 19, 1998

Method of processing circular patterning

Applicant:
Inventors:

Yoshiharu Shirakawabe, Chiba, JP;

Hiroshi Takahashi, Chiba, JP;

Susumu Ihcihara, Chiba, JP;

Michel Despont, Chiba, JP;

Assignee:

Seiko Instruments Inc., , JP;

Attorney:

Adams & Wilks

Primary Examiner:

Randy Gulakowski

Assistant Examiner:

Anita Alanko

Int. Cl.
CPC ...
B44C 1/22 ;
U.S. Cl.
CPC ...
B44C 1/22 ;
Abstract

A method of producing a circular island even if pollution by dirt or dust affects a mask pattern. A circular island is formed by etching silicon oxide film formed on a silicon substrate using a resist mask, and an acute angle portion of unevenness of the pattern outline comprising silicon oxide film is removed so as to obtain a smooth and substantially circular pattern by additional etching using buffered hydrofluoric acid solution (BHF) after removing the resist mask.

Find Patent Forward Citations

Shirakawabe, Yoshiharu. (2001). Method of processing circular patterning (U.S. Patent No. 6294099). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6294099

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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