The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2001
Filed:
Aug. 20, 1999
Applicant:
Inventors:
Jeremy Lansford, Austin, TX (US);
Allen L. Evans, Austin, TX (US);
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H01L 2/166 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H01L 2/166 ;
Abstract
The present invention is directed to semiconductor processing operations, and, more particularly, to a method and system for adjusting the thickness of process layers based upon the planarization efficiency of polishing operations. In one embodiment, the invention comprises determining the planarization efficiency of polishing operations, and adjusting the manufactured thickness of a process layer based upon the determined planarization efficiency.