The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2001
Filed:
Apr. 07, 1999
Applicant:
Inventors:
Jeffrey A. McKee, Grapevine, TX (US);
Ming J. Hwang, Dallas, TX (US);
Chih-Chen Cho, Richardson, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/02 ;
U.S. Cl.
CPC ...
C23F 1/02 ;
Abstract
A chemical mechanical polishing machine with ultrasonic vibration is disclosed. The chemical mechanical polishing machine (,) includes a movable abrasive surface (,). A wafer holder (,) holds a wafer (,) in contact with the abrasive surface (,), and a vibration generator (,) vibrates the wafer (,) during polishing. The ultrasonic vibration agitates the slurry and provides an additional degree of motion between the wafer and the abrasive surface, thereby increasing the speed and uniformity of the polishing.