The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Sep. 07, 1999
Applicant:
Inventors:
John M. White, Hayward, CA (US);
Wendell T. Blonigan, Union City, CA (US);
Michael W. Richter, Sunnyvale, CA (US);
Assignee:
Applied Komatsu Technology, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 5/04 ;
U.S. Cl.
CPC ...
F26B 5/04 ;
Abstract
A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled.