The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2001

Filed:

Mar. 19, 1999
Applicant:
Inventor:

Gary Hong, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract

A method of fabricating a flash memory is described. First, a shallow trench isolation structure is formed on the substrate, so that the surface of the shallow trench isolation structure is projected above the surface of the substrate. Then, a spacer is formed on the sidewall of the shallow trench isolation structure, which projects above the surface of the substrate. With the spacer serving as a mask, a gate oxide layer not covered by the spacer is etched to expose the substrate. By thermal oxidation, a self-aligned tunneling oxide layer is formed on the exposed substrate. The spacer is then removed. A floating gate is formed on the tunneling oxide layer. In addition, a dielectric layer and a control gate are formed on the floating gate in sequence, thus completing the flash memory structure.


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