The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2001

Filed:

Aug. 09, 2000
Applicant:
Inventors:

John T. Keech, Penfield, NY (US);

Donald O. Bigelow, Webster, NY (US);

Nathan D. Cahill, Rochester, NY (US);

Thomas F. Powers, Webster, NY (US);

John P. Spence, Webster, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/00 ;
U.S. Cl.
CPC ...
G03C 1/00 ;
Abstract

Reference calibration patches produced by a sequence of exposures on a photographic element, the photographic element exhibiting linear defects in a predominant direction, are arranged in a two dimensional array and exposures are assigned to the reference calibration patches in the array such that nearest neighbors in the predominant direction are not nearest neighbors in the exposure sequence, whereby the effects of a linear defect are reduced; and the maximum number of steps in the exposure sequence between a reference calibration patch and that of its nearest neighbors in any direction is less than a predetermined number, whereby the effects of flare are reduced.


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