The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2001
Filed:
Feb. 24, 2000
Applicant:
Inventors:
Takeshi Kinsho, Nakakubiki-gun, JP;
Tsunehiro Nishi, Nakakubiki-gun, JP;
Hideshi Kurihara, Usui-gun, JP;
Mutsuo Nakashima, Nakakubiki-gun, JP;
Koji Hasegawa, Nakakubiki-gun, JP;
Takeru Watanabe, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; C08F 1/000 ; C07C 6/774 ;
U.S. Cl.
CPC ...
G03F 7/004 ; C08F 1/000 ; C07C 6/774 ;
Abstract
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.