The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2001
Filed:
Jan. 22, 1998
Applicant:
Inventors:
Assignee:
United Microelectronics Corp., Taiwan, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ;
U.S. Cl.
CPC ...
B08B 3/02 ;
Abstract
An apparatus for removing photo-resist. The apparatus comprises carriers for carrying a wafer, hot plates to remove residue solvent on the wafer, a cooling plate to decrease the wafer temperature, an reverse unit to turn over the wafer, a development unit to develop and remove photo-resist on the wafer, a top scrubbing unit to clean a top side of the wafer, and a back scrubbing unit to clean a back side of the wafer.
Chung, Army. (2001). Apparatus for removing photo-resist (U.S. Patent No. 6283134). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6283134
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile