The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Mar. 03, 1999
Michael J. Penberth, Cambridgeshire, GB;
Graham S. Plows, Cambridgeshire, GB;
Adam Woolfe, Cambridgeshire, GB;
DuPont Photomasks, Inc, Round Rock, TX (US);
Abstract
An electron beam blanking method and system for selectively interrupting the flow of electrons during an electron beam lithographic process minimizes electron beam movement during blanking as the electron beam reaches a target lithographic mask. A first deflection plate pair deflects electrons flowing in the electron beam in the direction of the target lithographic mask. The first deflection plate pair includes a first tapered gap that is formed so that electrons which enter the first tapered gap before the initialization of a blanking voltage experience progressively greater electric field as they pass through the plates for controlling the cumulative deflection as the electrons travel through the first deflection plate pair. A second deflection plate pair further deflects electrons flowing in the electron beam in the direction of the target lithographic mask and includes a second tapered gap for further variably controlling the commutative deflection of the electron beam traveling through the second tapered gap. One or more hybrid integrated circuits provide deflection voltages to the first and second deflection plate pairs for varying the respective degree of electron beam deflection.