The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Dec. 09, 1998
Vassili Kitch, San Ramon, CA (US);
Michael E. Thomas, Milpitas, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A method for removing a resistive film formed on an electrode to increase the conductive contact area of the electrode positioned in a misaligned contact hole. The method comprises providing a substrate supporting an electrode layer. The electrode layer is etched to produce metal lines. During the processing of the metal lines, a resistive film is formed thereon. The resistive film is removed and a protective barrier is formed on the metal lines. A dielectric layer is formed on the substrate, including the metal lines. The dielectric layer is subsequently patterned to form contact holes or vias to expose a portion of the metal lines. The contact holes are filled with plugs such that a second electrode layer can be formed on the dielectric layer and the plugs.