The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
May. 09, 2000
Chuan-Fu Wang, Taipei Hsien, TW;
King-Lung Wu, Tainan Hsien, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A fabrication method for a borderless buried bit line is described. A substrate wherein a plurality of word lines and source/drain regions formed thereon is provided. A first insulation material is formed over the substrate and a node landing pad is formed in the first insulation material, wherein the node landing pad is covered by a second insulation material. A bit line contact is further formed in the first insulation material, wherein the bit line contact is covered by a third insulation material. Therefore, a trench is further formed along the sides of the bit line contact, traversing across the first insulation material. A partial filling of the trench with a conductive material, followed by filling the trench with a fourth insulation layer to complete the formation of the buried bit line.