The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Nov. 28, 1994
Applicant:
Inventors:
Gregory Breyta, San Jose, CA (US);
Nicholas Jeffries Clecak, San Jose, CA (US);
William Dinan Hinsberg, III, Fremont, CA (US);
Donald Clifford Hofer, San Martin, CA (US);
Hiroshi Ito, San Jose, CA (US);
Scott Arthur MacDonald, San Jose, CA (US);
Ratnam Sooriyakumaran, Fishkill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/26 ;
Abstract
The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.
Breyta, Gregory. (2001). Process for imaging of photoresist (U.S. Patent No. 6277546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6277546
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile