The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2001
Filed:
Jun. 19, 1999
Gary Hong, Hsinchu, TW;
Abstract
A method of fabricating a conductive line structure. A first dielectric layer is formed on a substrate. A conductive layer is formed on the first dielectric layer. The conductive layer is patterned to form an opening in the conductive layer. The opening exposes a portion of the first dielectric layer. A conformal stop layer is formed over the substrate. The conformal stop layer is conformal to the conductive layer. An oxide layer is formed in the opening. The oxide layer does not completely fill the opening. A portion of a sidewall of the opening is exposed. A spacer is formed on the exposed sidewall of the opening. The oxide layer is removed. A second dielectric layer is formed over the substrate to fill the opening. A void is formed in the second dielectric layer in the opening.