The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Dec. 22, 1999
Nobuaki Hamanaka, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
The magnetron sputtering apparatus of this invention has planar bodies,made of a material capable of capturing oxygen and water, heaters,to heat the planar bodies,, an oxygen monitor,and others in a load lock chamber,and separate chamber,. After a metal film has been formed on a silicon substrate,in a film forming chamber, the substrate is subjected to a heating treatment such that a metal silicide layer is formed. Before the silicon substrate being still hot is transferred to the load lock and separate chambers,and,, oxygen and water in the same chambers have been removed. Through this arrangement it is possible to prevent oxidation of the metal silicide layer, and to form a high melting point silicide layer having a low resistance.